TYPES OF PHOTORESIST AND PROCESS
Mask applied to wafer with photoresist material
Positive Photoresist
- Resist is exposed with UV light wherever the underlying material is to be removed
- Exposure to radiation changes the chemical structure of the resist so that it becomes more soluble in the developer solvent
- The exposed resist is then washed away by the developer solution, leaving windows of the bare underlying material
- The mask contains an exact copy of the pattern to remain
- Whatever goes shows