CONCLUSIONS OF PHOTORESIST PROCESS
Industry moved from imaging light sources from 350-450-nm down to 248-nm
Researching photoresist to support component design ɘ.18µm and later ɘ.13µm
Target for 2001-03 is to image light source of 193-nm
Target after 2003 image light source of 157-nm
Smaller wavelengths from light source creates smaller resist images