IMPORTANCE OF PHOTORESIST MATERIAL

• Intense drive towards designing and fabricating material with small dimensions(0.1-1?m)

  • Microelectronics business need to build devices containing increasing # of individual circuit elements
  • The Photoresist technology as a step in the microlithography process
  • Photoresist material: Polymeric resins can help create faster and smaller devices
  • Imaging light sources of smaller wavelengths(UV spectrum ranges from 117nm-410nm)
  • Traditional photoresist using 248nm resolve features between 0.25-0.18µm

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