MICROLITHOGRAPHY PROCESS STEPS
Doping
- Atoms with one less (boron or Al) or one more electron(phosphorus) than silicon introduced
- Alters the electrical character of silicon
- P-Type (positive-boron) or N-type(negative-phosphorus) to reflect their conducting characteristics
-
First 4 steps repeated several times
- Front end of wafer completed (all active devices are formed)